Beamline 11-BM

  • General Information
    • Source Type
      Three pole wiggler

      Status
      Operational

      General User Beamtime
      0%

      Energy Range Category
      Hard X-Ray (1-50 keV)

      Energy Range
      10-17 keV

      Beamline Type
      Participating Research Team (PRT)

      Beamline Description
      CMS provides instrumentation for simultaneous small- and wide-angle x-ray scattering (SAXS, WAXS) as well as scattering in grazing incidence geometry (GISAXS, GIWAXS), giving access to complementary information at multiple length scales ranging from Angstroms to submicrons. In addition, the moderate microfocusing capability enables scanning microbeam characterization of heterogeneous materials at resolutions of tens of microns. The beamline will also develop capabilities for automation-aided intelligent exploration of vast parameter spaces.

      Technique(s)
      X-ray Scattering, Small- and Wide-angle
      X-ray Scattering, Surface

      Research Types
      Materials Science

  • Contact Information
    • Spokesperson The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.
      Masafumi Fukuto, Brookhaven National Laboratory, fukuto@bnl.gov, 344-5256

      Local Contact The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.
      Ruipeng Li, Brookhaven National Laboratory, rli@bnl.gov, 344-5994
      Kevin Yager, Brookhaven National Laboratory, kyager@bnl.gov, 344-7608

      Beamtime Scheduler The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.

      Beamline Phone
      631-344-

  • Instrumentation
    • Beamline Characteristics

      Energy RangeMono Crystal or GratingResolution (ΔE/E)FluxSpot Size (mm)Total Angular Acceptance (mrad)
      10-17 keV Ru/B4C multilayers 0.007 (ΔE/E) 1010 - 1012 ph/s 0.05-0.5 mm (H); 0.02-0.3 mm (V) 0.05-1.5 mrad (H); 0.05-0.2 mrad (V)
      q range: 0.003 - 5 [CAPITAL_A_RING][SUP]-1[/SUP]

      Source Type
      Three pole wiggler

      Optical System
      Double multilayer monochromator. Primary toroidal focusing mirror. Secondary KB mirrors.

      Experimental Apparatus
      Area detectors: Pilatus 300k for SAXS (to be upgraded to Pilatus 2M in summer 2017); Photonic Sciences in-vacuum CCD for WAXS. Ion chambers, scintillatior, diamond diode, and photo diodes for beam intensity monitoring. Computer-controlled sample position, tilt, and rotation stages. Temperature-controlled sample holders for array of capillaries and thin films. Option for in-vacuum sample environment. On-axis and off-axis sample viewing.

      Computer System Hardware & Software
      Beamline components are controlled by EPICS. The user interface is through CSS-Studio and Python clients. The user views the experimental system (sample and the surrounding environment) through CCD-coupled optical microscopes using Prosilica cameras. Linux Debian running IOCs. Dedicated Linux and Windows computers for area detectors.

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