Beamline 3-ID

  • General Information
    • Source Type
      U20 Undulator


      General User Beamtime

      Energy Range Category
      Hard X-Ray (1-50 keV)

      Energy Range
      6 - 25 keV

      Beamline Type
      Facility Beamline

      Beamline Description
      The Hard X-ray Nanoprobe (HXN) is an undulator beamline at sector 3-ID providing structural and X-ray fluorescence imaging with world-leading spatial resolution. The scientific mission of the beamline is to enable hard X-ray imaging of structure, elements, strain and chemical states with spatial resolutions ranging from 10 to 30 nm with an ultimate goal of ~1 nm.

      X-ray Diffraction Micro/Nanoprobe
      X-ray Fluorescence Micro/Nanoprobe

      Research Types
      Analyze elemental composition, structure, oxidation states, crystalline phase, orientation, and strain in complex material systems.

  • Contact Information
    • Spokesperson The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.
      Yong Chu, Brookhaven National Laboratory,, 344-5582
      Hanfei Yan, Brookhaven National Laboratory,, 344-7097

      Local Contact The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.
      Xiaojing Huang, Brookhaven National Laboratory,, 344-8726
      Evgeny Nazaretski, Brookhaven National Laboratory,, 344-4428

      Beamtime Scheduler The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.

      Beamline Phone

  • Instrumentation
    • Beamline Characteristics

      Energy RangeMono Crystal or GratingResolution (ΔE/E)FluxSpot Size (mm)Total Angular Acceptance (mrad)
      6 - 25 keV >5*10^8 ph/s @ 10 keV at sample position 10nm by 10nm for MLL, 30nm by 30nm for FZP

      Source Type
      U20 Undulator

      Optical System
      Major components of the beamline optical system include a horizontal collimating mirror, a horizontal double-crystal monochromator, a horizontal focusing mirror, a set of vertical focusing compound-refractive lenses and two secondary source apertures.

      Experimental Apparatus
      Major apparatus include a MLL module for 10 nm resolution, a FZP module for 30 nm resolution, a rotation stages for tomography and heating and cooling stages.

      Computer System Hardware & Software
      Workstations, CPU and GPU clusters and data analysis software

  • Links